Synthesis and characterization of Pd-Ni-P Thin Films using electrodeposition method

Abstract

This research investigated the synthesis conditions and properties of Pd–Ni–P thin films electrodeposited onto indium tin oxide-coated glass (ITO/glass) substrates. Electrodeposition was conducted at temperatures of 40 and 60 °C , with applied voltages ranging from 3 to 10 V. The electrolyte solution consisted of 0.03 M PdCl2, 0.05 M NiSO4, 0.5 M H3PO4, 0.4 M C2H8N2 (ethylenediamine), and 0.06 M NaCl. At the beginning of this research, Ni and Cu were applied to the electrochemical cell and then changed to be Pt/Ti served as an anode, while the ITO/glass substrate acted as the cathode, maintained at an electrode spacing of 2.5 cm. Deposition duration was varied between 5 and 10 minutes. The surface morphology and roughness of the resulting films were characterized using scanning electron microscopy (SEM) and atomic force microscopy (AFM), respectively. Additionally, X-ray diffraction (XRD) and water contact angle measurements were employed to analyze the structural properties and wettability. SEM analysis revealed that the films possess nanoscale grain sizes, while the broad XRD diffraction peaks indicated an amorphous or nanocrystalline structure. Furthermore, the films demonstrated hydrophilic behavior, with water contact angles ranging from 50° to 80°.